Surface roughening and scaling behavior of vacuum-deposited SnCl2Pc organic thin films on different substrates
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Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates
Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...
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